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dc.contributor.advisorDroopad, Ravindranath
dc.contributor.authorCunningham, Thiess H. ( )
dc.date.accessioned2012-11-30T20:33:17Z
dc.date.available2012-11-30T20:33:17Z
dc.date.issued2012-11-30
dc.identifier.urihttps://digital.library.txstate.edu/handle/10877/4390
dc.description.abstractThe continued scaling of Si CMOS devices as had been practiced by the electronics industry has reached the point where, alternative solutions to the conventional MOSFET device need to be found. There is widespread consensus that high mobility III-V channel materials with their high electron mobilities and velocities will enable increased performance and reduced power consumption at scaled geometries. While the industry is currently targeting the 11 nm technology node for their introduction, there are significant challenges remaining before high mobility materials can be adopted for high volume manufacturing (HVM). One of the requirements is that these materials need to be epitaxially integrated onto silicon and be able to withstand the processing environment in the various CMOS modules. The challenge is to characterize and eventually to minimize the defects in these heterostructures when grown on silicon substrates due to the differences in lattice constants. Characterization of these structures is necessary to determine whether there are any roadblocks to device operation. In this thesis, the electrical characterization of MBE grown III-V InGaAs/InAlAs heterostructures on silicon and native InP substrates using variable field Hall measurements at temperatures ranging from 10K-room temperature in magnetic fields from 0-9T will be presented. From these measurements, Quantitative Mobility Spectrum Analysis (QMSA) of the data is carried out to determine the densities and mobilities of the carriers and the effect of epitaxial defects on channel transport and buffer leakage. This data is then used for growth optimization to be able to develop material structures suitable for HVM of CMOS at the 11nm node and beyond.
dc.formatText
dc.format.extent67 pages
dc.format.medium1 file (.pdf)
dc.language.isoen_US
dc.subjectQMSA
dc.subjectIII-V
dc.subjectHeterostructures
dc.subjectIII-V on Silicon
dc.subjectSEMATECH
dc.subjectCunningham
dc.subjectDroopad
dc.subject.lcshMetal oxide semiconductors, Complementaryen_US
dc.subject.lcshMolecular beam epitaxyen_US
dc.subject.lcshHeterostructuresen_US
dc.subject.lcshMetal oxide semiconductor field-effect transistorsen_US
dc.subject.lcshSemiconductorsen_US
dc.titleQuantitative Mobility Spectrum Analysis of III-V Heterostructures On Silicon
txstate.documenttypeThesis
dc.contributor.committeeMemberWong, Man Hoi
dc.contributor.committeeMemberDonnelly, David
thesis.degree.departmentPhysics
thesis.degree.disciplinePhysics
thesis.degree.grantorTexas State University
thesis.degree.levelMasters
thesis.degree.nameMaster of Science
txstate.departmentPhysics


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