Show simple item record

dc.contributor.advisorSpencer, Gregory F.
dc.contributor.authorWaxler, Chad Lawrence ( )
dc.date.accessioned2013-04-30T16:25:32Z
dc.date.available2013-04-30T16:25:32Z
dc.date.issued2013-04
dc.identifier.citationWaxler, C. L. (2013). Ellipsometric analysis of silicon nanoparticles formed by thermal annealing (Unpublished thesis). Texas State University, San Marcos, Texas.
dc.identifier.urihttps://digital.library.txstate.edu/handle/10877/4564
dc.description.abstractIn this study, we investigate the surface morphology and optical properties of silicon nanoparticles formed on a silicon-on-insulator substrate by thermal annealing of a thin silicon layer. The annealing is performed using a rapid thermal annealer in an argon environment at atmospheric pressure. We analyze the formation of silicon nanoparticles as a function of silicon layer thickness, annealing temperature, and annealing duration using Atomic Force Microscopy (AFM) and we analysis the optical properties via Effective Medium Approximations (EMA) models using a Variable Angle Spectroscopic Ellipsometer (VASE). The results of these experiments showed that samples with a smaller initial silicon layer thicknesses produce larger average particle size and have a wider distribution of sizes than samples with thicker silicon top layers. As the annealing temperature and duration increases, so does the average nanoparticle radius. Analysis of the oxidation of the nanoparticles revealed that samples which exhibited a narrow distribution of small nanoparticles sizes oxidizes to a lesser extent than those with larger particles and wider distributions.
dc.formatText
dc.format.extent70 pages
dc.format.medium1 file (.pdf)
dc.language.isoen
dc.subjectSilicon Nanoparticles Ellipsometry Oxidation Thermal Annealing
dc.subject.lcshNanosiliconen_US
dc.subject.lcshNanostructured materialsen_US
dc.subject.lcshNanotechnologyen_US
dc.subject.lcshSilicon--Analysisen_US
dc.subject.lcshNanochemistryen_US
dc.subject.lcshEllipsometryen_US
dc.titleEllipsometric Analysis of Silicon Nanoparticles Formed by Thermal Annealing
txstate.documenttypeThesis
dc.contributor.committeeMemberGeerts, Wilhelmus
dc.contributor.committeeMemberDroopad, Ravindranath
thesis.degree.departmentPhysics
thesis.degree.disciplinePhysics
thesis.degree.grantorTexas State Universityen_US
thesis.degree.levelMastersen_US
thesis.degree.nameMaster of Scienceen_US
txstate.departmentPhysics


Download

Thumbnail

This item appears in the following Collection(s)

Show simple item record