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dc.contributor.authorAhmed, Raju ( Orcid Icon 0000-0002-1374-2287 )
dc.contributor.authorNazari, Mohammad ( )
dc.contributor.authorHancock, Bobby Logan ( )
dc.contributor.authorSimpson, J. ( )
dc.contributor.authorEngdahl, C. ( )
dc.contributor.authorPiner, Edwin L. ( )
dc.contributor.authorHoltz, Mark ( Orcid Icon 0000-0001-9524-964X )
dc.date.accessioned2019-04-11T19:54:48Z
dc.date.available2019-04-11T19:54:48Z
dc.date.issued2018-05-03
dc.identifier.citationAhmed, R., Nazari, M., Hancock, B. L., Simpson, J., Engdahl, C., Piner, E. L. & Holtz, M. W. (2018). Ultraviolet micro-Raman stress map of polycrystalline diamond grown selectivity on silicon substrates using chemical vapor deposition. Applied Physics Letters, 112(18), 181907.en_US
dc.identifier.urihttps://digital.library.txstate.edu/handle/10877/7979
dc.description.abstractPolycrystalline diamond stripes, with a nominal thickness of ∼1.5 μm and various widths, were selectively grown on silicon substrates using chemical vapor deposition. Stress measurements using ultraviolet micro-Raman mapping reveal high compressive stress, up to ∼0.85 GPa, at the center of the diamond stripe, and moderate tensile stress, up to ∼0.14 GPa, in the substrate close to the interface with the diamond. Compressive stresses on diamond decrease with diminishing stripe widths. The stress map is well-described using finite element simulation incorporating solely thermal expansion effects.en_US
dc.formatText
dc.format.extent4 pages
dc.format.medium1 file (.pdf)
dc.language.isoen_USen_US
dc.publisherAIP Publishingen_US
dc.sourceApplied Physics Letters, 2018, Vol. 112, No. 21.
dc.subjectDiamonden_US
dc.subjectUltraviolet micro-Raman stress mapen_US
dc.subjectChemical vaporen_US
dc.subjectThermal effectsen_US
dc.titleUltraviolet Micro-Raman Stress Map of Polycrystalline Diamond Grown Selectivity on Silicon Substrates Using Chemical Vapor Depositionen_US
txstate.documenttypeArticle
dc.identifier.doihttps://doi.org/10.1063/1.5027507
txstate.departmentPhysics


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