Investigation of thin film cobalt silicide formation on thermal oxide barrier layers

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dc.contributor.authorLarison, Dana L.
dc.date.accessioned2021-03-17T14:01:26Z
dc.date.available2021-03-17T14:01:26Z
dc.date.issued2004-08
dc.description.abstractNo abstract prepared.
dc.description.departmentPhysics
dc.formatText
dc.format.extent126 pages
dc.format.medium1 file (.pdf)
dc.identifier.citationLarison, D. L. (2004). Investigation of thin film cobalt silicide formation on thermal oxide barrier layers (Unpublished thesis). Texas State University-San Marcos, San Marcos, Texas.
dc.identifier.citationLarison, D. L. (2004). Investigation of thin film cobalt silicide formation on thermal oxide barrier layers (Unpublished thesis). Texas State University-San Marcos, San Marcos, Texas.
dc.identifier.urihttps://hdl.handle.net/10877/13247
dc.language.isoen
dc.subjectthin films
dc.subjectsilicides
dc.subjectcobalt
dc.titleInvestigation of thin film cobalt silicide formation on thermal oxide barrier layers
dc.typeThesis
thesis.degree.departmentPhysics
thesis.degree.grantorTexas State University-San Marcos
thesis.degree.levelMasters
thesis.degree.nameMaster of Science

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