Low-k Dielectric Materials by Diblock Copolymer Deposition

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dc.contributor.authorGalloway, Heather
dc.date.accessioned2006-08-30T10:06:37Z
dc.date.available2012-02-24T10:06:59Z
dc.date.issued2005-08
dc.descriptionResearch Enhancement Program Final Report
dc.description.abstractWe have demonstrated the ability to prepare thin films of PMMA/PS diblock copolymers and to investigate their surface properties using AFM. We have also confirmed the required surface preparation and annealing times for these substrates. Future work will concentrate on other diblock polymers as well as using our extension to preparing these materials on SiC and SiCN to test their electrical properties.
dc.description.departmentSponsored Programs
dc.formatText
dc.format.extent1 page
dc.format.medium1 file (.pdf)
dc.identifier.citationGalloway, H. (2005). <i>Low-k dielectric materials by diblock copolymer deposition</i>. Research Enhancement Program, Texas State University, San Marcos, TX.
dc.identifier.urihttps://hdl.handle.net/10877/2896
dc.language.isoen
dc.subjectdielectric materials
dc.subjectdiblock
dc.subjectcopolymers
dc.subjectfilms
dc.subjectpolymers
dc.subjectelectrical properties
dc.titleLow-k Dielectric Materials by Diblock Copolymer Deposition
dc.typeReport

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