Temperature Programmed Desorption of Graphene Oxide Under Ultra-High Vacuum

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dc.contributor.advisorVentrice, Carl A.
dc.contributor.authorField, Daniel Alexanderen_US
dc.contributor.committeeMemberSpencer, Gregory F.
dc.contributor.committeeMemberTheodoropoulou, Nikoleta
dc.date.accessioned2009-06-22T10:20:33Z
dc.date.available2012-02-24T10:20:33Z
dc.date.issued2009-05en_US
dc.description.abstractGraphene oxide is an electrical insulator that shows potential for use in nanoscale electronic devices. An understanding of the thermal stability of graphene oxide sheets is important since the electrical, chemical, and mechanical properties of graphene oxide will change as it is reduced at elevated temperatures. In this study, graphene oxide films were grown by deposition of an aqueous solution of graphene oxide onto oxygen plasma cleaned silicon nitride on silicon substrates. The thermal stability of these films was studied by temperature programmed desorption under ultra-high vacuum conditions. The primary decomposition components of the films are H2O, CO2, and CO.en_US
dc.description.departmentPhysics
dc.formatText
dc.format.extent75 pages
dc.format.medium1 file (.pdf)
dc.identifier.citationField, D. A. (2009). <i>Temperature programmed desorption of graphene oxide under ultra-high vacuum</i> (Unpublished thesis). Texas State University-San Marcos, San Marcos, Texas.
dc.identifier.urihttps://hdl.handle.net/10877/4016
dc.language.isoen
dc.subjectGraphene oxideen_US
dc.subjectElectron diffractionen_US
dc.subjectAnnealingen_US
dc.subjectVacuum activation energyen_US
dc.subjectDesorptionen_US
dc.subject.classificationPhysicsen_US
dc.titleTemperature Programmed Desorption of Graphene Oxide Under Ultra-High Vacuumen_US
dc.typeThesis
thesis.degree.departmentPhysics
thesis.degree.disciplinePhysics
thesis.degree.grantorTexas State University-San Marcos
thesis.degree.levelMasters
thesis.degree.nameMaster of Science

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