Growth from below: Bilayer graphene on copper by chemical vapor deposition
dc.contributor.author | Nie, Shu | |
dc.contributor.author | Wu, Wei | |
dc.contributor.author | Xing, Shirui | |
dc.contributor.author | Yu, Qingkai | |
dc.contributor.author | Bao, Jiming | |
dc.contributor.author | Pei, Shin-shem | |
dc.contributor.author | McCarty, Kevin | |
dc.date.accessioned | 2021-08-24T15:07:52Z | |
dc.date.available | 2021-08-24T15:07:52Z | |
dc.date.issued | 2012-09 | |
dc.description.abstract | We evaluate how a second graphene layer forms and grows on Cu foils during chemical vapor deposition (CVD). Low-energy electron diffraction and microscopy is used to reveal that the second layer nucleates and grows next to the substrate, i.e., under a graphene layer. This underlayer mechanism can facilitate the synthesis of uniform single-layer films but presents challenges for growing uniform bilayer films by CVD. We also show that the buried and overlying layers have the same edge termination. | |
dc.description.department | Engineering | |
dc.format | Text | |
dc.format.extent | 9 pages | |
dc.format.medium | 1 file (.pdf) | |
dc.identifier.citation | Nie, S., Wu, W., Xing, S., Yu, Q., Bao, J., Pei, S., & McCarty, K. F. (2012). Growth from below: bilayer graphene on copper by chemical vapor deposition. New Journal of Physics, 14, 093028. | |
dc.identifier.doi | https://doi.org/10.1088/1367-2630/14/9/093028 | |
dc.identifier.issn | 1367-2630 | |
dc.identifier.uri | https://hdl.handle.net/10877/14437 | |
dc.language.iso | en | |
dc.publisher | IOP Science | |
dc.rights.license | This work is licensed under a Creative Commons Attribution-NonCommercial-ShareAlike 3.0 Unported License. | |
dc.source | New Journal of Physics, Vol. 14, Article 093028, pp. 1-9. | |
dc.subject | bilayer graphene | |
dc.subject | copper | |
dc.subject | chemical vapor deposition | |
dc.subject | single-layer films | |
dc.subject | bilayer films | |
dc.subject | Ingram School of Engineering | |
dc.title | Growth from below: Bilayer graphene on copper by chemical vapor deposition | |
dc.type | Article |