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dc.contributor.advisorChung, Matthias C.
dc.contributor.authorMiller, Geoffrey F.
dc.date.accessioned2012-07-17T19:28:47Z
dc.date.available2012-07-17T19:28:47Z
dc.date.issued2012-07-17
dc.date.submittedAugust 2012
dc.identifier.urihttps://digital.library.txstate.edu/handle/10877/4259
dc.description.abstractA nonstandard photolithographic exposure tool motivates the search for a method to determine photoresist thickness in real time. Optical physics of two-interface thin film systems and the theory of Fourier series reveal a way to calculate photoresist thickness by applying an FFT (fast Fourier transform) algorithm to the reflectance spectrum of a light beam incident on the photoresist. Analyses of simulated data and preliminary measurements assess the speed and accuracy of the FFT algorithm and suggest further areas of research.
dc.formatText
dc.format.extent69 pages
dc.format.medium1 file (.pdf)
dc.language.isoen_US
dc.subjectPhotolithograpthy
dc.subjectPhotolithography on non-flat substrates
dc.subjectFourier
dc.subjectFast Fourier transform and Fourier series
dc.subject.lcshPhotoresists
dc.subject.lcshPhotolithography
dc.subject.lcshFourier transformations
dc.subject.lcshMathematical physics
dc.titleA Fast Fourier Transform Approach to Finding the Thickness of Single-Layer Thin Films with Slowly Varying Indices of Refraction and Negligible Absorption Coefficients
txstate.documenttypeThesis
dc.contributor.committeeMemberGeerts, Wilhelmus J.
dc.contributor.committeeMemberPassty, Gregory B.
thesis.degree.departmentMathematics
thesis.degree.disciplineMathematics
thesis.degree.grantorTexas State University
thesis.degree.levelMasters
thesis.degree.nameMaster of Science
txstate.departmentMathematics


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